24 miesiące - Warranty is granted by the retailer for a period of 24 months.
CS-01 Combat Shirt -MAPA®
Uniform clothing in the original and unique MAPA® (Multi-environmental Adaptive Pattern) camouflage, intended for civilian and professional users who are interested in the military and actively spend their time outdoors - as well as in difficult and extreme conditions.
The collection of tactical uniforms produced by the Polish company MASKPOL SA offers the user a comfortable and functional cut combined with a unique and the only type of MAPA® masking print on the market. The combat shirt is made of a fabric composed of 50% cotton / 50% polyester, additionally reinforced with a Rip-Stop weave, which increases durability and wear and tear resistance. The shirt is made of a thermoactive fabric 95% Polyester / 5% Lycra, which breathes well and is quick-drying.
The Combat Jacket CS-01 combat shirt will be perfect for all combat and outdoor activities, and its special design with thermoactive inserts will improve the comfort of wearing along with tactical equipment such as plate carrier vests.
Features of the Combat Pants:
- Camouflage MAPA®
- sleeves made of material reinforced with a Rip-Stop weave
- body made of breathable knitted fabric with a soft internal structure
- 2 pockets on the shoulders
- pockets for elbow pads
- Velcro panels for attaching markings / patches / ID
- Velcro adjustable cuffs - made in Poland
Przedsiębiorstwo Sprzętu Ochronnego MASKPOL SA is a leading manufacturer of protective equipment and gear, which is part of the Polish Armaments Group. The company has been operating on the market since the 1960s, offering high-quality protective equipment for the Polish Army and other countries.
The MAPA® pattern was designed at the Academy of Fine Arts in Gdańsk. The camouflage is the result of many years of studying the European natural environment and a rare combination of a macro and micro-pattern. MAPA® has received very positive feedback from soldiers and hobbyists due to its innovative design and high masking properties.
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